Page 07404 (Chemical)

Cat NO.	Product Name	CAS
4109505	SILICON INGOT 99.999%	7440-21-3
4213785	SILICONISED GLASSWOOL	N/A
4287362	SILICON, ISOTOPIC, SI SINGLE CRYSTAL, IRMM STANDARD	N/A
1531721	SILICON (IV) ACETATE, MIN. 95%	562-90-3
1530007	SILICON (IV) CHLORIDE, 99+%	10026-04-7
1100178	SILICON(IV) CHLORIDE, 99.8+%	10026-04-7
1531808	SILICON (IV) CHLORIDE, FIBER OPTIC GRADE (99.9999%-SI) SPECTRO	10026-04-7
1531729	SILICON (IV) CHLORIDE, (99.99+%-SI) SPECTRO	10026-04-7
1531723	SILICON (IV) IODIDE (99.9%-SI)	13465-84-4
1528889	SILICON (IV) NITRIDE, ALPHA PHASE, 96%	12033-89-5
1528620	SILICON (IV) NITRIDE, ALPHA PHASE, 99.9% (METALS BASIS)	12033-89-5
1528722	SILICON (IV) NITRIDE, BETA PHASE, 96%	12033-89-5
4387320	SILICON (IV) NITRIDE, MGO BINDER, SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)	N/A
4387321	SILICON (IV) NITRIDE, MGO BINDER, SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)	N/A
4387322	SILICON (IV) NITRIDE, MGO BINDER, SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)	N/A
4387323	SILICON (IV) NITRIDE, MGO BINDER, SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)	N/A
1531720	SILICON (IV) NITRIDE, 99% 0.7 MICRON	12033-89-5
CRM012803	SILICON (IV) NITRIDE, NIST	12033-89-5
CRM012804	SILICON (IV) NITRIDE, NIST QUANTITATIVE ANALYSIS	12033-89-5
1528763	SILICON (IV) NITRIDE, SPUTTERING TARGET	12033-89-5
4116544	SILICON(IV) OXIDE, AMORPHOUS 99.7% (METALS BASIS) 11-15 MICRON	60676-86-0
4116545	SILICON(IV) OXIDE, AMORPHOUS 99.7% (METALS BASIS) 16-20 MICRON	60676-86-0
4116546	SILICON(IV) OXIDE, AMORPHOUS 99.7% (METALS BASIS) 21-25 MICRON	60676-86-0
4116547	SILICON(IV) OXIDE, AMORPHOUS 99.7% (METALS BASIS) 8-10 MICRON	60676-86-0
4116548	SILICON(IV) OXIDE, CRYSTALLINE 99.6% (METALS BASIS) 11-15 MICRON	60676-86-0
4116549	SILICON(IV) OXIDE, CRYSTALLINE 99.6% (METALS BASIS) 16-20 MICRON	60676-86-0
4116550	SILICON(IV) OXIDE, CRYSTALLINE 99.6% (METALS BASIS) 21-25 MICRON	60676-86-0
4116551	SILICON(IV) OXIDE, CRYSTALLINE 99.6% (METALS BASIS) 8-10 MICRON	60676-86-0
1531807	SILICON (IV) OXIDE ELECTRONIC GRADE (99.999%-SI)	60676-86-0
1528879	SILICON(IV) OXIDE, FUMED ACTIVITED 99.8% (METALS BASIS) 11-15 MICRON	112945-52-5
1528878	SILICON(IV) OXIDE, FUMED ACTIVITED 99.8% (METALS BASIS) 16-20 MICRON	112945-52-5
1528880	SILICON(IV) OXIDE, FUMED ACTIVITED 99.8% (METALS BASIS) 21-25 MICRON	112945-52-5
1528987	SILICON(IV) OXIDE, FUMED ACTIVITED 99.8% (METALS BASIS) 8-10 MICRON	112945-52-5
1528869	SILICON(IV) OXIDE, FUMED 99.8% (METALS BASIS) 11-15 MICRON	112945-52-5
1528870	SILICON(IV) OXIDE, FUMED 99.8% (METALS BASIS) 16-20 MICRON	112945-52-5
1528871	SILICON(IV) OXIDE, FUMED 99.8% (METALS BASIS) 21-25 MICRON	112945-52-5
1528868	SILICON(IV) OXIDE, FUMED 99.8% (METALS BASIS) 8-10 MICRON	112945-52-5
6095101	SILICON(IV) OXIDE, HYDROPHILIC 99.8% METALS BASIS, PARTICLE SIZE:7-40NM ,(BET):300M2/G	112945-52-5
1528980	SILICON (IV) OXIDE, 99.5% -300 MESH POWDER	60676-86-0
1528582	SILICON (IV) OXIDE, 99.5% -500 MESH POWDER	60676-86-0
4108868	SILICON (IV) OXIDE 99.99% (METALS BASIS) -200 MESH	60676-86-0
1528991	SILICON (IV) OXIDE, 99.9% (METALS BASIS) -325 MESH	60676-86-0
1528982	SILICON (IV) OXIDE, 99.995% (METALS BASIS) -40 MESH POWDER	60676-86-0
1530001	SILICON (IV) OXIDE 99.99% (METALS BASIS) 3-5MM FUSED LUMP FOR VACCUM DEPOSITION	60676-86-0
1528925	SILICON (IV) OXIDE, 99.99% (METALS BASIS) 1-3MM FUSED LUMP FOR VACCUM DEPOSITION	60676-86-0
1528666	SILICON (IV) OXIDE, 99.99% (METALS BASIS) 3-12MM FUSED LUMP FOR VACCUM DEPOSITION	60676-86-0
4116542	SILICON (IV) OXIDE, 99.99% (METALS BASIS) NANOMETER GRADE	60676-86-0
4116543	SILICON (IV) OXIDE, 99.999% (METALS BASIS) SPUTTERING TARGET	60676-86-0
1531717	SILICON (IV) OXIDE, 99+%, 0.012 MICRON (FUMED COLLOIDAL SILICA)	112945-52-5
4116540	SILICON (IV) OXIDE, 99% 60NM 400 M2/G	60676-86-0
4116541	SILICON (IV) OXIDE, 99.9% 20NM 600 M2/G	60676-86-0
4108881	SILICON (IV) OXIDE, 99+% 10NM 600 M2/G MIN	60676-86-0
4116539	SILICON (IV) OXIDE, 99% 20NM SURFACE TREATED	60676-86-0
4387324	SILICON (IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.995% (METALS BASIS)	N/A
4387325	SILICON (IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)	N/A
4387326	SILICON (IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.995% (METALS BASIS)	N/A
4387327	SILICON (IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)	N/A
6111096	SILICON(IV) PHTHALOCYANINE BIS(TRIHEXYLSILYLOXIDE)	92396-89-9
2300441	SILICON (IV) PHTHALOCYANINE DICHLORIDE, 85%	19333-10-9
4398506	SILICON (IV) SULFIDE, 97%	13759-10-9
CRM012801	SILICON LINE POSITION (XRD), NIST	7440-21-3
1528685	SILICON LUMP 99.999+% (METALS BASIS)	7440-21-3
2307861	SILICON LUMP 2MM-10MM 99%	7440-21-3
CRM913550	SILICON MANGANESE, CERTIFIED REFERENCE MATERIAL	N/A
CRM012798	SILICON (METALLO-ORGANIC), NIST	7440-21-3
CRM012802	SILICON METAL, NIST	7440-21-3
3503196	SILICON-29 METAL (29SI, 90%)	N/A
1529991	SILICON MONOXIDE, GRANULES ABOUT 40 MESH ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1531727	SILICON MONOXIDE, GRANULES ABOUT 1-3MM ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1529990	SILICON MONOXIDE, GRANULES ABOUT 8-10 MM ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1528667	SILICON MONOXIDE, 99.98% (METALS BASIS) 1-5MM GRANULES FOR VACCUM DEPOSITION	10097-28-6
1528811	SILICON MONOXIDE, 99.9% (METALS BASIS) PIECES FOR VACCUM DEPOSITION	10097-28-6
4106713	SILICON MONOXIDE, 99.9% POWDER -325MESH	10097-28-6
1528633	SILICON MONOXIDE, POWDER -100 MESH ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1529955	SILICON MONOXIDE, POWDER -200 MESH ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1528979	SILICON MONOXIDE, POWDER -300 MESH ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
1529962	SILICON MONOXIDE, POWDER -500 MESH ELECTRONIC GRADE 99.5+% (99.9%-SI)	10097-28-6
3503576	SILICON MONOXIDE, (SIO) OPTICAL WINDOW‘0.3-1MM, 99.9%, 1.55NM'550, 800-8000NM, 1200-1600C	10097-28-6
3503577	SILICON MONOXIDE, (SIO) OPTICAL WINDOW‘1-3MM, 99.9%, 1.55NM'550, 800-8000NM, 1200-1600C	10097-28-6
3503578	SILICON MONOXIDE, (SIO) OPTICAL WINDOW‘15-30MM, 99.9%, 1.55NM'550, 800-8000NM, 1200-1600C	10097-28-6
3503579	SILICON MONOXIDE, (SIO) OPTICAL WINDOW‘3-5MM, 99.9%, 1.55NM'550, 800-8000NM, 1200-1600C	10097-28-6
3503580	SILICON MONOXIDE, (SIO) OPTICAL WINDOW‘5-10MM, 99.9%, 1.55NM'550, 800-8000NM, 1200-1600C	10097-28-6
1528767	SILICON MONOXIDE, SPUTTERING TARGET 99.9%	10097-28-6
4106384	SILICON MONOXIDE, SPUTTERING TARGET 99.95%	10097-28-6
4109459	SILICON, NANOPOWDER 98+% 20-50 NM	7440-21-3
6111095	SILICON 2,3-NAPHTHALOCYANINE BIS(TRIHEXYLSILYLOXIDE)	92396-88-8
CRM913556	SILICON NITRIDE, CERTIFIED REFERENCE MATERIAL	N/A
4345676	SILICON NITRIDE-15N	N/A
CRM913551	SILICON NITRIDE - PARTICLE SIZE, CERTIFIED REFERENCE MATERIAL	N/A
CRM913555	SILICON NITRIDE POWDER, CERTIFIED REFERENCE MATERIAL	N/A
CRM913554	SILICON NITRIDE POWDER - IMPUTITIES AND BETA-PHASE FRACTION, CERTIFIED REFERENCE MATERIAL	N/A
CRM913552	SILICON NITRIDE - SPECIFIC SURFACE AREA, CERTIFIED REFERENCE MATERIAL	N/A
CRM913553	SILICON NITRIDE - SPECIFIC SURFACE AREA, CERTIFIED REFERENCE MATERIAL	N/A
4387339	SILICON, OIL BASED STANDARD SOLUTION, SPECPURE®, SI 1000µG/G	N/A
4387340	SILICON, OIL BASED STANDARD SOLUTION, SPECPURE®, SI 5000µG/G	N/A
4109477	SILICON OPTICAL LENS	7440-21-3
4109478	SILICON OPTICAL PRISM	7440-21-3
4109508	SILICON OPTICAL WINDOW	7440-21-3
4387333	SILICON OPTICAL WINDOW, 25.4MM (1.0IN) DIA X 1MM (0.04IN) THICK	N/A
4387334	SILICON OPTICAL WINDOW, 25.4MM (1.0IN) DIA X 2MM (0.08IN) THICK	N/A